High-throughput nanoscale lithographic technologies have been intensively studied and developed in relation to the upcoming 10-nm node and beyond for the improvement of semiconductor manufacturing ...
For the first time an international team realized direct writing of silver nanostructures using an electron beam applied to a substrate. Silver nanostructures have the potential to concentrate visible ...
Trehalose glycopolymer resists allow direct writing of protein patterns by electron-beam lithography
Direct-write patterning of biomolecules at micrometre and nanometre length scales has the potential to enable pattern generation with fewer fabrication steps. In addition, direct-write approaches ...
When it comes to extremely fine, precise features, a scanning electron microscope (SEM) is unrivaled. A focused electron beam can directly deposit complex features onto a substrate in a single step ...
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